- April 08, 2011
ORLANDO, FL | Teknek’s Nanocleen technology (booth # 1315) is featured at the debut of ICE USA, held April 6--8 at the Orange County Convention Center in Orlando. The contact cleaning technology is claimed to remove much smaller particles (down to 25 nm) and eliminates 25-50% more particles than other contact cleaners. In addition the roller has static dissipating qualities (reducing static by a factor of 10 compared to traditional contact cleaners). Once the contamination is removed it is transferred to a pre-sheeted roll of adhesive film. The new Nanocleen Plus roll also incorporates static dissipating qualities making it suitable for very thin materials that can cling to the rollers. Both the roller and adhesive roll used in the Nanocleen system are 100% silicone free to help prevent contaminating the substrate.
Also debuting at ICE USA is the new XWCH3 clean machine which is suited for wide web applications up to 2,500 mm wide and reportedly offers simple installation, 24/7 operation, ease of use and minimal maintenance.
The new Nanocleen Plus adhesive roll is also featured and is available for the first time in ultra-wide widths of 2,200 mm with the advantage of 100% coverage of the elastomer roller with no gaps.